Thin films: how to create innovative materials

The objective is, in a first part, to study the relationship between elaboration conditions of thin films, structure and associated micro/nanostructure, and the desired specific properties in various application fields: optics, electronics, chemistry and biology. The search of new performances, the development of nanotechnologies and the need for innovation require a mutifunctional approach for the conception of the objects. On the surface, i.e. at the interface with the external medium, specific properties are occuring and must be optimized and/or considered to be different from the ones of the bulk material.

This course will first introduce the theoretical bases of surfaces and interfaces. The deposition techniques of thin films by PVD (Physical Vapor Deposition) will be then developed. The next section will be dedicated to the techniques to report thin films onto silicon and to the elaboration of 2D materials. The specific electrical properties of thin films (influence of bidimensionality on the carriers, films of nanometric thickness taking into account the quantum nature of their electronic properties) will be then presented. The last part of the course will be dedicated to the elaboration of self-assembled monolayers and to aerogels. A practical session will allow the students to take part to a molecular beam epitaxy experiment in the cleanroom.