This course introduces the main methods involved in the surface analysis of material surfaces. It tackles questions on the chemistry and physics of the various approaches and discusses the advantages and shortcomings of a high number of methods including X-Ray Photoelectron Spectroscopy, Auger Electron Spectroscopy, Scanning Electron Microscopy, Secondary Ion Mass Spectrometry, Ion Scattering Spectroscopy, etc.
This course introduces the main methods involved in the surface analysis of material surfaces. It tackles questions on the chemistry and physics of the various approaches and discusses the advantages and shortcomings of a high number of methods including X-Ray Photoelectron Spectroscopy, Auger Electron Spectroscopy, Scanning Electron Microscopy, Secondary Ion Mass Spectrometry, Ion Scattering Spectroscopy, etc.
Introduction Context - Parameters X-Ray interaction with matter Electron interaction with matter Ion interaction with matter
X-Ray detection based surface analysis techniques XRF - X-ray Fluorescence • Principles (characteristic X-rays, scattered X-rays) • Instrumentation (X-ray sources, WDS) • Qualitative and quantitative analysis (matrix effects) • Applications EPMA - Electron Probe Micro-Analysis / Scanning Electron Microscopy + EDS • Principles (characteristic X-rays) • Instrumentation (electron gun, EDS) • Qualitative and quantitative analysis (imaging, matrix effects) • Applications
Electron detection based surface analysis techniques 3.1. XPS – X-ray Photoelectron Spectroscopy • Principles (photoelectric effect, calibration, charge effect) • Instrumentation • Qualitative and quantitative analysis (core levels, chemical shifts, Auger parameter, valence levels, imaging) • Applications 3.2. AES – Auger Electron Spectroscopy • Principles (Auger electron energy; spectra derivation) • Instrumentation • Qualitative and quantitative analysis (qualitative analysis, depth profiling, SAM, chemical shifts) • Applications
Ion detection based surface analysis techniques 4.1. SIMS – Secondary Ion Mass Spectrometry • Sputtering & ionization • Instrumentation (ion sources, mass analyzers, detectors) • Dynamic SIMS (SIMS) vs static SIMS (ToF-SIMS) • Depth profiling, mass spectra and SIMS imaging • Applications 4.2. ISS – Ion Scattering Spectroscopy & RBS – Rutherford Backscattering • Low energy ion diffusion - ISS • High energy ion diffusion - RBS • Instrumentation • Applications
Practical: ToF-SIMS – Time-of-Flight Secondary Ion Mass Spectrometry (2h) and XPS – X-ray Photoelectron Spectroscopy (1h) : description of the instruments and of the experimental procedures + data treatment with comparison of results on a similar sample (e.g. Si wafer)